Modified Shrinking Core Model for Atomic Layer Deposition of TiO2on Porous Alumina with Ultrahigh Aspect Ratio
نویسندگان
چکیده
منابع مشابه
Mechanisms of atomic layer deposition on substrates with ultrahigh aspect ratios.
Atomic layer deposition (ALD) appears to be uniquely suited for coating substrates with ultrahigh aspect ratios (> or similar 10(3)), including nanoporous solids. Here, we study the ALD of Cu and Cu3N on the inner surfaces of low-density nanoporous silica aerogel monoliths. Results show that Cu depth profiles in nanoporous monoliths are limited not only by Knudsen diffusion of heavier precursor...
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ژورنال
عنوان ژورنال: Bulletin of the Korean Chemical Society
سال: 2013
ISSN: 0253-2964
DOI: 10.5012/bkcs.2013.34.2.519